The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2005
Filed:
Sep. 21, 2004
Applicant:
Weibiao Zhang, Plano, TX (US);
Inventor:
Weibiao Zhang, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03M001/20 ;
U.S. Cl.
CPC ...
Abstract
A dithering method is provided for sigma-delta converters in a deep-submicron process. The dither is a random interleaving of quantizer thresholds levels. The random interleaving dither is more effective than previous static dither methods to remove idle channel tones of sigma-delta analog-to-digital converters (ADC). The dither is easy to implement and takes less area than other dynamic dither methods.