The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2005
Filed:
May. 16, 2003
Applicant:
Yo-han Choi, Hwaseong-Gun, KR;
Inventor:
Yo-Han Choi, Hwaseong-Gun, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F001/00 ;
U.S. Cl.
CPC ...
Abstract
A method of making a photomask ensures that the mask pattern is precisely formed. A mask blank is provided in which an opaque film and a mask film are disposed on a transparent substrate. The mask film and the opaque film are successively etched to form an opaque pattern and a mask pattern. Next, a dimension of the opaque pattern is measured. If the measured dimension of the opaque pattern is smaller than a reference value, the opaque pattern is etched using the mask pattern as an etching mask to attain the desired dimension of the opaque pattern. The mask pattern is then removed.