The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2005

Filed:

Jul. 09, 2002
Applicants:

Maurice Gell, Newington, CT (US);

Tongsan D. Xiao, Willington, CT (US);

Leon Shaw, Willington, CT (US);

Eric Jordan, Storrs, CT (US);

Xiangliang Jiang, Changsha, CN;

Inventors:

Maurice Gell, Newington, CT (US);

Tongsan D. Xiao, Willington, CT (US);

Leon Shaw, Willington, CT (US);

Eric Jordan, Storrs, CT (US);

Xiangliang Jiang, Changsha, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B009/00 ;
U.S. Cl.
CPC ...
Abstract

A contiguous duplex microstructured material comprises a nanostructured material having two structural states, for example, a duplex microstructured coating. One state comprises substantially nanostructured features, while the second state substantially comprises microstructured features. A duplex nanostructured coating can be made by thermal spraying a reconstituted nanostructured material onto a substrate under conditions effective to form a coating comprising more than one structural state.


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