The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2005

Filed:

Jul. 25, 2001
Applicant:

Toshihiko Tanaka, Komagane, JP;

Inventor:

Toshihiko Tanaka, Komagane, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K009/00 ;
U.S. Cl.
CPC ...
Abstract

A defect inspection system is provided which comprises an image acquiring section for acquiring a two-dimensional image of a subject which is a processing target in a manufacturing process, a defect extracting section for extracting a defect by a defect extraction algorithm using a predetermined parameter for an image acquired by the image acquiring section, a displaying section for displaying an image of a defect of the subject extracted by the defect extracting section, a parameter adjusting section for adjusting the parameter in accordance with a defect extraction degree for the subject, and a quality judging section for judging the quality of the subject based on a defect information extracted by the defect extracting section.


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