The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2005
Filed:
Jun. 07, 2002
Shoji Miura, Aichi-ken, JP;
Mikimasa Suzuki, Toyohashi, JP;
Akira Kuroyanagi, Okazaki, JP;
Yoshitaka Nakano, Aichi-ken, JP;
Shoji Miura, Aichi-ken, JP;
Mikimasa Suzuki, Toyohashi, JP;
Akira Kuroyanagi, Okazaki, JP;
Yoshitaka Nakano, Aichi-ken, JP;
Denso Corporation, Kariya, JP;
Abstract
A drift layer is formed on a substrate. A base region is formed on the drift layer. A plurality of source regions are formed in a surficial layer of the base region. A plurality of gate electrodes face to the base region and the source region via a gate insulating film. A source electrode is brought into contact with the base region and the source region. A nitrogen cluster containing layer is embedded in the drift layer so as to extend laterally under the base region so that at least part of the drift region is left under the nitrogen cluster containing layer.