The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2005

Filed:

Apr. 16, 2002
Applicants:

Tse-chi Mou, Hsin-Chu, TW;

Ying-lun Chang, Hsin-Chu, TW;

Cheng-hung Yu, Hsin-Chu, TW;

Chin-yi Chou, Hsin-Chu, TW;

Inventors:

Tse-Chi Mou, Hsin-Chu, TW;

Ying-Lun Chang, Hsin-Chu, TW;

Cheng-Hung Yu, Hsin-Chu, TW;

Chin-Yi Chou, Hsin-Chu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B21D053/76 ;
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a printhead for raising its product acceptance rate and improving its quality is provided. The method of manufacturing printheads includes steps of providing a base layer, forming a pattern layer on the base layer by a semi-conductor manufacturing process, forming a dry film of a channel barrier layer having an ink channel, a flow channel and plural ink cavities on the pattern layer; and adhering a nozzle plate on the dry film of the channel barrier layer by thermal compression. The pattern layer further includes a flow pattern and a base pattern surround a central location reserved for the ink channel, wherein the base pattern comprises at least a heating layer and a passivation layer, and the flow pattern is made of the same material and at the same height as the base pattern.


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