The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2005
Filed:
Jan. 30, 2002
Christian Crell, Forstinning, DE;
Christian Crell, Forstinning, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The whole-area defect inspection of masks is made possible by interconnecting two otherwise independent defect inspection systems via a powerful bus system or interface. As a result, two masks that are identical, at least in sub-areas, can be inspected and compared in parallel and in real time. It is not necessary to temporarily store large quantities of data. The running defect inspection can be interrupted flexibly and continued again. This implementation of mask-to-mask inspection takes into account that simulation algorithms for die-to-database inspection of future mask technology, for example, alternating phase masks, EUV masks, stencil masks, and so on are not available in good time. In addition, the inspection time is reduced considerably.