The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2005
Filed:
Aug. 20, 2004
Ken-ichi Hayashi, Nakagun, JP;
Kazuyoshi Itoh, Kawanishi, JP;
Ken-ichi Hayashi, Nakagun, JP;
Kazuyoshi Itoh, Kawanishi, JP;
Sumitomo Heavy Industries, Ltd., Tokyo, JP;
Abstract
A marking method is provided which permits an easy detecting of the presence of a mark without using a specific reading apparatus, and is capable of avoiding a damage as well as a strength deterioration of an object material. The marking method comprises: preparing a marking object; converging, into the marking object, a laser beam having a wave length range so chosen that the laser beam can transmit through a material forming the marking object, and then effecting a multiple photon absorption; and moving a converging position of the laser beam, in a manner such that an area, whose refractive index is changed due to the multiple photon absorption, can form a diffraction pattern capable of diffracting a visible light.