The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2005
Filed:
Dec. 30, 2003
Shawn Jenkins, Duluth, GA (US);
Henry Skoog, Roswell, GA (US);
Matthew Dudensing, San Antonio, TX (US);
Lidia Vega, San Antonio, TX (US);
Hector Barrera, San Antonio, TX (US);
Thao Doan, Fort Worth, TX (US);
Shawn Jenkins, Duluth, GA (US);
Henry Skoog, Roswell, GA (US);
Matthew Dudensing, San Antonio, TX (US);
Lidia Vega, San Antonio, TX (US);
Hector Barrera, San Antonio, TX (US);
Thao Doan, Fort Worth, TX (US);
Kimberly-Clark Worldwide, Inc., Neenah, WI (US);
Abstract
The present invention discloses and claims a fill system and method for reducing the chemical concentration gradient in absorbent materials. The fill system includes a source of liquid connected to a nozzle for dispensing the liquid into a container. The nozzle includes a dispersal face that defines primary apertures approximately equidistant from the outer perimeter and center point on the dispersal face. The nozzle may also include secondary apertures proximate to the outer perimeter and one or more tertiary apertures proximate to the center point. The dispersal of fluid through the secondary or tertiary apertures may be less approximately one-half of the dispersal of fluid through the primary apertures.