The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Oct. 27, 2004
Christos Dimaridis, Salonika, GR;
Niranjan Mayya, Mississauga, CA;
Thanasis Triantafyllidis, Salonika, GR;
Yanchun Wang, Mississauga, CA;
Christos Dimaridis, Salonika, GR;
Niranjan Mayya, Mississauga, CA;
Thanasis Triantafyllidis, Salonika, GR;
Yanchun Wang, Mississauga, CA;
Pulse Microsystems, Ltd., Mississauga, CA;
Abstract
The invention pertains to a method of applying a stippling stitch design to an area defining an asymmetrical polygon in a coordinate planar display format, involving: defining a pathway, which may be based on a fractal design, within a geometrically symmetrical boundary, the pathway comprising a single non-intersecting line; conforming the pathway to an asymmetrical polygon area substantially disposed within the geometrically symmetrical boundary; deriving a plurality of coordinate points representative of the pathway; and passing the points to a data storage medium in a pre-determined embroidery data format.