The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Jun. 03, 2003
Edward Fadel, Durham, NC (US);
Robert P. Freese, Chapel Hill, NC (US);
David Reed, Chapel Hill, NC (US);
Dale S. Walker, Houston, TX (US);
Edward Fadel, Durham, NC (US);
Robert P. Freese, Chapel Hill, NC (US);
David Reed, Chapel Hill, NC (US);
Dale S. Walker, Houston, TX (US);
Bright View Technologies, Inc., Chapel Hill, NC (US);
Abstract
A micro-lens array with a precisely aligned aperture mask, and a method of forming the same, is provided. The aperture mask is formed by projecting light onto a mask layer using each lenslet in the micro-lens array. The intensity of the light and the mask layer material are chosen so that the light forms apertures in the mask layer via a non-ablative process. The resulting apertures are automatically aligned with their respective lenslets.