The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2005

Filed:

Sep. 20, 2002
Applicants:

Thomas D. Bonifield, Dallas, TX (US);

Vladimir A. Ukraintsev, Allen, TX (US);

Inventors:

Thomas D. Bonifield, Dallas, TX (US);

Vladimir A. Ukraintsev, Allen, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L029/04 ;
U.S. Cl.
CPC ...
Abstract

The present invention describes a plurality of scatterometry test structures for use in process control during fabrication of a semiconductor wafer having multilevel integrated circuit chips, many of said levels having a feature size of a critical dimension. The scatterometry test structures on the wafer are at each level, suitable to measure critical dimensions. The second level and each subsequent level of the test structures are located to fit into the same footprint area as the first level.


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