The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2005

Filed:

Apr. 16, 2004
Applicants:

Ronald M. Sundelin, Yorktown, VA (US);

Tong Wang, Newport News, VA (US);

Inventors:

Ronald M. Sundelin, Yorktown, VA (US);

Tong Wang, Newport News, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J037/20 ; F16M011/20 ; B23Q001/03 ; B23Q003/18 ;
U.S. Cl.
CPC ...
Abstract

An apparatus for enabling accurate retaining of a precise position, such as for reacquisition of a microscopic spot or feature having a size of 0.1 mm or less, on broad-area surfaces after non-in situ processing. The apparatus includes a sample and sample holder. The sample holder includes a base and three support posts. Two of the support posts interact with a cylindrical hole and a U-groove in the sample to establish location of one point on the sample and a line through the sample. Simultaneous contact of the third support post with the surface of the sample defines a plane through the sample. All points of the sample are therefore uniquely defined by the sample and sample holder. The position registration system of the current invention provides accuracy, as measured in x, y repeatability, of at least 140 μm.


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