The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2005

Filed:

Oct. 15, 1999
Applicants:

Gina M. Buccellato, Eagan, MN (US);

Thomas P. Hedblom, Eagan, MN (US);

John L. Vandenberg, Maplewood, MN (US);

Inventors:

Gina M. Buccellato, Eagan, MN (US);

Thomas P. Hedblom, Eagan, MN (US);

John L. Vandenberg, Maplewood, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B005/128 ;
U.S. Cl.
CPC ...
Abstract

A exposed-lens retroreflective article exhibiting retroreflection under dry and wet conditions is provided. The inventive article comprises a first set of optical elements having a first reflective layer disposed on the embedded portion of the elements. The first set contributes mainly to dry retroreflection. The article further comprises a second set of optical elements having a second reflective layer behind a spacing layer. The second set contributes mainly to wet retroreflection. In one embodiment, the first and second sets of optical elements have substantially the same average diameters, refractive index, and density.


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