The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Sep. 09, 1998
Joan Manuel Garcia, Sant Cugat, ES;
Juan Carles Vives, San Diego, CA (US);
Gonzalo Gaston, Barcelona, ES;
Josep Maria Serra, San Diego, CA (US);
Shailendra Kumar, San Diego, CA (US);
Javier Lagares, Castellv de la Marca, ES;
Joan Manuel Garcia, Sant Cugat, ES;
Juan Carles Vives, San Diego, CA (US);
Gonzalo Gaston, Barcelona, ES;
Josep Maria Serra, San Diego, CA (US);
Shailendra Kumar, San Diego, CA (US);
Javier Lagares, Castellv de la Marca, ES;
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
A program creates a unitary mask for use over a whole image, with one pattern. The mask need not be full image size; it may be tiled. In the field a printer forms a mask and prints with it, best in the same session, before another image needing another mask, whether due to different image activity or type, or operating conditions. Constraints are controlled to ensure solution. Printout can start before a mask (even the part needed to finish a top swath) is done, going columnwise in each swath. In other invention facets, a program forms a mask of size significant relative to the program and prints with it. Other facets check print conditions and form adapted masks; or find nozzles that cannot back up a known-failed nozzle and to back it up form masks with all able nozzles; or assess image activity and inject mask randomness accordingly.