The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6965092 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 15, 2005

Filed:

Feb. 12, 2002
Applicant:

Imad Mahawili, Grand Rapids, MI (US);

Inventor:

Imad Mahawili, Grand Rapids, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27B005/14 ;
U.S. Cl.
CPC ...
Abstract

An apparatus and method and processing a semiconductor substrate that controls heating of the substrate to thereby control the depth of the junctions formed by impurities implanted in the semiconductor substrate by heating a device side of the semiconductor substrate to a reference temperature and heating the device side of the semiconductor substrate to a heat activation temperature that is greater than the reference temperature for an activation period, which provides sufficient energy to activate the impurities so that they become part of the lattice structure of the substrate while minimizing diffusion of the impurities across the substrate and reducing the temperature gradient in the substrate to minimize stress in the substrate.


Find Patent Forward Citations

Mahawili, Imad. (2005). Ultra fast rapid thermal processing chamber and method of use (U.S. Patent No. 6965092). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6965092

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