The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Jan. 12, 2004
Masahiro Usuki, Kashima-gun, JP;
Tadashi Amano, Kashima-gun, JP;
Masahiro Usuki, Kashima-gun, JP;
Tadashi Amano, Kashima-gun, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A process is provided for producing a vinyl chloride-based polymer by polymerization of vinyl chloride or a monomer mixture containing it in a reaction vessel. Heat generated during polymerization is removed using a reflux condenser. When the polymerization rate is within a range from 30% to 50%, a copolymeric polyether, with a weight average molecular weight of 1,500,000 to 2,000,000, and an ethylene oxide to propylene oxide molar ratio within a range from 78/22 to 82/18, is added to the reaction mass. Foaming of the polymer slurry due to the use of the reflux condenser beyond the point where the polymerization rate reaches 60% is suppressed, and the polymer can be produced with no deleterious effects on the quality of the product polymer.