The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Jul. 22, 2003
Kwanyoung Lee, Daejeon, KR;
Young Jin Kim, Daejeon, KR;
Jong Kim, Daejeon, KR;
Korea Kumho Petrochemical Co., Ltd., Seoul, KR;
Abstract
The present invention relates to a ternary copolymer represented by the following formula (1) of the penta-block structure, wherein the molecular weight is 50, 000 to 400,000, pB is more than 70% of 1,4 structure, the content of pS is in range of 5% to 50%, and pB and pI are in a weight ratio of pB/pI≧1.pS-pI-pB-pI-pS  (1) Wherein, pS is vinyl aromatic polymer, pB is polybutadiene and pI is polyisoprene. The block copolymer in the present invention with the structure, in which polyisoprene block is inserted between vinyl aromatic polymer block and polybutadiene block, has high mechanical properties such as tensile strength. The manufacturing method of the ternary block copolymer with penta-block structure is also provided.