The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2005

Filed:

Nov. 24, 2003
Applicants:

Cha Deok Dong, Ichon-Shi, KR;

IL Keoun Han, Seoul, KR;

Inventors:

Cha Deok Dong, Ichon-Shi, KR;

Il Keoun Han, Seoul, KR;

Assignee:

Hynix Semiconductor Inc., Kyungki-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/76 ;
U.S. Cl.
CPC ...
Abstract

The present invention is provided to form a floating gate of a flash memory device capable of restricting a thickness of a buffer oxide film to a thickness less than 50 Å to minimize increment in a thickness due to a wall oxidation process in the case of depositing the buffer oxide film prior to depositing the first polysilicon film and the pad nitride film, and reducing a thickness of the first polysilicon film with an HF dip time minimized in a pre-treatment cleaning process prior to depositing the second polysilicon film, and protecting the first polysilicon film from being attacked in a pad nitride film strip process, by removing at least 50% of the buffer oxide film in the pad nitride film strip process.


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