The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Nov. 20, 2000
Applicants:
Sang-jun Choi, Seoul, KR;
Hyun-woo Kim, Seongnam, KR;
Sang-gyun Woo, Suwon, KR;
Joo-tae Moon, Suwon, KR;
Inventors:
Sang-jun Choi, Seoul, KR;
Hyun-woo Kim, Seongnam, KR;
Sang-gyun Woo, Suwon, KR;
Joo-tae Moon, Suwon, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/039 ;
U.S. Cl.
CPC ...
Abstract
A photosensitive copolymer has a weight-average molecular weight of 3,000 to 100,000 and is represented by the following formula:wherein Ris a hydrogen atom or methyl, Ris an acid-labile tertiary alkyl group, and m/(m+n) is 0.5 to 0.8.
Choi, Sang-jun. (2005). Photosensitive polymer having cyclic backbone and resist composition containing the same (U.S. Patent No. 6964839). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6964839
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile