The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Aug. 31, 2001
Bruce M. Levine, Arcadia, CA (US);
Bruce M. Levine, Arcadia, CA (US);
Metrologic Instruments, Inc., Blackwood, NJ (US);
Abstract
An improved ophthalmic instrument for estimating aberrations in the eyes of a patient and providing the patient with a view of optical correction of the aberrations so as to provide instant feedback as to the accuracy of the estimated aberrations. The ophthalmic instrument comprises an adaptive optic subsystem for sensing and correcting estimated aberrations in a patient's eye, and a fixation target providing a view of correction of the estimated aberrations. The adaptive optics subsystem includes a wavefront sensor and a multi-stage phase compensator. The multi-stage phase compensator includes a first stage for compensating for a defocus component of the estimated aberrations, and at least one other additional stage for compensating other higher order components of estimated aberrations. Preferably, the first stage comprises a variable focus lens for defocus correction, and the additional stage(s) comprises a deformable mirror for correction of higher order aberrations estimated in the eye.