The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2005
Filed:
Feb. 02, 2004
Denis Heliot, Sugar Land, TX (US);
Jacques R. Tabanou, Houston, TX (US);
Jaideva C. Goswami, Houston, TX (US);
Denis Heliot, Sugar Land, TX (US);
Jacques R. Tabanou, Houston, TX (US);
Jaideva C. Goswami, Houston, TX (US);
Schlumberger Technology Corporation, Sugar Land, TX (US);
Abstract
One or more high resolution logs of a formation property having thin beds is provided for the laminated formation. From this log, the bed boundaries are detected and the facies for each of the beds detected is identified, using one or more high resolution logs of the laminated formation. Each of the identified facies is then defined. One or more squared logs for formation property is then generated by using the imported volumetric descriptions of the facies to generate a value of the formation property for each of the beds. A reconstructed log is generated and compared with a low resolution log of the formation property for laminated formation. By adjusting the values of the squared log the difference between the reconstructed log and the squared log may be minimized. An optimized squared log is output as having the square log and the volumetric analyses thereon.