The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2005
Filed:
Jan. 14, 2004
Kai-ping Chuang, Pingtung, TW;
Lih-gen Sheu, Taoyuan, TW;
Meng-chang Tsai, Hsinchu, TW;
Yinchieh Lai, Hsinchu, TW;
Kai-Ping Chuang, Pingtung, TW;
Lih-Gen Sheu, Taoyuan, TW;
Meng-Chang Tsai, Hsinchu, TW;
Yinchieh Lai, Hsinchu, TW;
National Chiao Tung University, Hsinchu, TW;
Abstract
The present invention provides a two-beam interference exposure system that can be simply adjusted by rotating only one mirror. By placing a half-wave plate in one of the interference arms and precisely scanning the relative fiber position, the present invention can expose true apodized fiber Bragg gratings in a single scan by simultaneously rotating the angle of the half-wave plate. By rotationally switching the fast and slow axes of the half-wave plate, the present invention can also expose n-phase-shifted fiber grating by the same system.