The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2005
Filed:
May. 26, 2000
Yutaka Hayashi, Yokohama, JP;
Osamu Yamashita, Musashino, JP;
Masaya Iwasaki, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus transfers a pattern of a mask onto a substrate and includes a covering member which is disposed in the exposure apparatus and which substantially isolates a predetermined spacing from outside gas. The covering member includes a first thin film made of a first material which blocks penetration of the outside gas with respect to the predetermined spacing and a second thin film having a low degasification property and made of a second material of at least one of a metal and an inorganic substance. An exposure method transfers a pattern of a mask onto a substrate and includes the steps of isolating a part spacing of an optical path spacing for an exposure beam which transfers the pattern of the mask onto the substrate from outside gas by using such a covering member.