The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6960528 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 01, 2005

Filed:

Sep. 20, 2002
Applicants:

Kuie-hsien Chen, Taipei, TW;

Jih Shang Hwang, Tau-Yuen, TW;

Debajyoti Das, West Bengal, IN;

Hong Chun Lo, Sun-Yi, TW;

Li-chyong Chen, Taipei, TW;

Inventors:

Kuie-Hsien Chen, Taipei, TW;

Jih Shang Hwang, Tau-Yuen, TW;

Debajyoti Das, West Bengal, IN;

Hong Chun Lo, Sun-Yi, TW;

Li-Chyong Chen, Taipei, TW;

Assignee:

Academia Sinica, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/461 ;
U.S. Cl.
CPC ...
Abstract

Nanotip arrays are formed by exposing a substrate to a process gas mixture that simultaneously forms nanomasks on the substrate surface and etches exposed portions of the substrate surface to form the nanotip array. Components of the process gas mixture form nanocrystallites on the surface of the substrate, thereby masking portions of the substrate from other components of the process gas mixture, which etch exposed portions of the substrate. Accordingly, nanotip arrays formed using this technique can have nanocrytallite endpoints.


Find Patent Forward Citations

Chen, Kuie-Hsien. (2005). Method of forming a nanotip array in a substrate by forming masks on portions of the substrate and etching the unmasked portions (U.S. Patent No. 6960528). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6960528

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