The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2005
Filed:
Jan. 16, 2004
Applicants:
David William Boerstler, Round Rock, TX (US);
Franklin Manuel Baez, Ithaca, NY (US);
Eskinder Hailu, Austin, TX (US);
Inventors:
David William Boerstler, Round Rock, TX (US);
Franklin Manuel Baez, Ithaca, NY (US);
Eskinder Hailu, Austin, TX (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03K005/13 ;
U.S. Cl.
CPC ...
Abstract
An apparatus, a method, and a computer program are provided for correcting charge in a Phased Lock Loop (PLL). Typically, PLL's utilize a Low Pass Filter (LPF). However, as a result of improvement of Complimentary Metal-Oxide on a Semiconductor (CMOS) technology charge leakage has become prevalent within LPFs. As a result, the method, apparatus, and computer program provide a device and/or methodology for correcting for charge leakage.