The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2005
Filed:
Mar. 11, 2003
Richard A. Metzler, Mission Viejo, CA (US);
Richard A. Metzler, Mission Viejo, CA (US);
Integrated Discrete Devices, LLC, Costa Mesa, CA (US);
Abstract
Trench MOSFETs and self aligned processes for fabricating trench MOSFETs. These processes produce a higher density of trenches per unit area than can be obtained using prior art masking techniques. The invention self aligns all processing steps (implants, etches, depositions, etc.) to a single mask, thus reducing the pitch of the trenches by the added distances required for multiple masking photolithographic tolerances. The invention also places the source regions and contacts within the side walls of the trenches, thus eliminating the lateral dimensions required, for masking and source depositions or implants from the top surface, from the pitch of the trenches. Various embodiments are disclosed.