The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2005
Filed:
Dec. 22, 2000
Tomoyuki Hiroki, Kanagawa, JP;
Tomoyuki Hiroki, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for manufacturing a liquid jet recording head having an element substrate provided with a plurality of discharge energy generating elements for applying discharging energy to a recording liquid in accordance with image data, a liquid chamber for storing the recording liquid, and a top plate having a plurality of nozzles, is provided. The method includes a step of forming, on an anisotropic-etching mask layer provided on a nozzle surface of the top plate, compensation patterns extending to a liquid chamber region in order to form the nozzles and the liquid chamber by anisotropic etching, and a step of performing anisotropic etching of the top plate through the mask layer and forming the liquid chamber to have a substantially rectangular shape at the nozzle surface of the top plate by over-etching portions with the compensation patterns.