The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2005
Filed:
Dec. 12, 2002
Applicant:
Takamitsu Furukawa, Tokyo, JP;
Inventor:
Takamitsu Furukawa, Tokyo, JP;
Assignee:
Oki Electric Industry, Co., Ltd., Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/54 ; G03B027/68 ; G03B027/72 ;
U.S. Cl.
CPC ...
Abstract
A device for exposure of an object surface having a predetermined shrinkage rate during a baking process of the object. The device includes an optical system having a light source irradiating light towards a target location. A filter is provided between the target location and the light source. The filter has a transmission rate that is adjustable to at least three different levels and which passes light from the light source therethrough.
Furukawa, Takamitsu. (2005). Method of forming resist pattern, and exposure device (U.S. Patent No. 6956641). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6956641
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile