The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2005

Filed:

Jul. 02, 2003
Applicant:

Reed F. Busse, San Mateo, CA (US);

Inventor:

Reed F. Busse, San Mateo, CA (US);

Assignee:

General Electric Company, Milwaukee, WI (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V003/00 ;
U.S. Cl.
CPC ...
Abstract

A technique is set forth that is designed to reduce RF induced power in high field MR imaging that includes application of an initial contrast preserving phase of RF pulses. These initial RF pulses are designed to have a constant, relatively high flip angle over the initial contrast preserving phase. Following an effective TE, a ramp down phase is applied that has a limited number of RF pulses with a flip angle that is less than the flip angle of those in the initial contrast preserving phase. Further, the RF pulses in the ramp down phase have a flip angle that is decreased over the ramp down phase. This technique provides improved resolution and steady contrast and SNR, while significantly reducing induced RF power.


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