The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2005

Filed:

Aug. 27, 2002
Applicants:

Harry Rosenberg, Pittsburgh, PA (US);

Bahri Ozturk, Cranberry Township, PA (US);

Guangxin Wang, Cranberry Township, PA (US);

Wesley Larue, Ellwood City, PA (US);

Inventors:

Harry Rosenberg, Pittsburgh, PA (US);

Bahri Ozturk, Cranberry Township, PA (US);

Guangxin Wang, Cranberry Township, PA (US);

Wesley LaRue, Ellwood City, PA (US);

Assignee:

Honeywell International Inc., Morristown, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/00 ;
U.S. Cl.
CPC ...
Abstract

Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.


Find Patent Forward Citations

Rosenberg, Harry. (2005). Tantalum sputtering target and method of manufacture (U.S. Patent No. 6955938). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6955938

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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