The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2005
Filed:
Jan. 31, 2002
Masashi Aoki, Kanagawa-ken, JP;
Kazunori Komatsu, Kanagawa-ken, JP;
Masakazu Nishikawa, Kanagawa-ken, JP;
Junichi Nakamikawa, Kanagawa-ken, JP;
Masashi Aoki, Kanagawa-ken, JP;
Kazunori Komatsu, Kanagawa-ken, JP;
Masakazu Nishikawa, Kanagawa-ken, JP;
Junichi Nakamikawa, Kanagawa-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa-Ken, JP;
Abstract
When a master medium and a slave medium are brought into close contact and a transfer magnetic field is applied thereto to perform magnetic transfer, the leakage magnetic field intensity of the transfer magnetic field is regulated to within a permissible range, making possible the transfer of an exact magnetic pattern. After a magnetic field is applied to the slave face in the track direction thereof to initially magnetize the slave medium in the track direction, the master medium and the slave medium are brought into close contact. When applying a transfer magnetic field in the track direction of the slave face to perform a magnetic transfer, the magnetic field intensity component in the direction opposite that in which the transfer magnetic field is to be applied is regulated to less than or equal to ½ the magnetic coercive force Hcs of the slave medium over the entire slave surface.