The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2005
Filed:
Nov. 05, 2003
Yasuhiro Yamamoto, Tokyo, JP;
Takahiro Yamauchi, Miyagi, JP;
Yasuhiro Yamamoto, Tokyo, JP;
Takahiro Yamauchi, Miyagi, JP;
Oki Electric Industry Co., Ltd., Tokyo, JP;
Abstract
A method of manufacturing an alignment mark structure and aligning a substrate includes providing a semiconductor substrate having an upper layer, the alignment mark structure being formed on a surface region of the upper layer. The method includes providing the surface region as having opposite first and second parallel sides extending along the upper layer, with outer side walls extending upwardly from the upper layer and extending lengthwise along the side. The outer side walls are provided lengthwise with alternating first and second wall portions, each of the first wall portions being spaced farther from the first side of the surface region than each of the second wall portions. An alignment pattern is defined by providing openings in the alignment mark structure.