The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2005

Filed:

Jan. 17, 2002
Applicants:

Katsuhiko Namba, Hirakata, JP;

Junji Nakanishi, Kyoto, JP;

Yasunori Uetani, Toyonaka, JP;

Inventors:

Katsuhiko Namba, Hirakata, JP;

Junji Nakanishi, Kyoto, JP;

Yasunori Uetani, Toyonaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K005/06 ; G03F007/004 ;
U.S. Cl.
CPC ...
Abstract

A chemical amplifying type positive resist composition having excellent sensitivity and resolution, manifesting no generation of scum is provided, which comprises a resin which has a polymerization unit derived from hydroxystyrene and a polymerization unit derived from 2-ethyl-2-adamantyl (meth)acrylate, and is insoluble or poorly soluble itself in an alkali, but becomes alkali-soluble after dissociation of the above-mentioned acid unstable group by the action of an acid; a radiation sensitive acid generating agent; and polypropylene glycol.


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