The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2005
Filed:
Sep. 10, 2003
Gary L. Jahns, Encinitas, CA (US);
Yixin Zhang, Albuquerque, NM (US);
Anthony Peter Palladino, Franklin Lakes, NJ (US);
Gary L. Jahns, Encinitas, CA (US);
YiXin Zhang, Albuquerque, NM (US);
Anthony Peter Palladino, Franklin Lakes, NJ (US);
Peak Sensor Systems LLC, Albuquerque, NM (US);
Abstract
A method and system for use in monitoring/evaluating industrial processes such as, for example, plasma processes are provided. In one embodiment, a plasma process fault detection module () includes multiple sub-modules. A data selection sub-module () obtains selected optical emissions spectra (OES) data for each wafer that is processed. A model building/updating sub-module () constructs multiple models from the OES data for a number of wafers. A principal component analysis (PCA) analysis sub-module () utilizes PCA techniques to determine whether the OES data for a particular wafer differs significantly from an expected normal wafer as represented by the models. A model maintenance sub-module () saves and retrieves models for different processes, associating the current wafer with the correct process. A wafer categorization sub-module () categorizes each wafer based on a scalar metric characterizing the residual spectrum vector. A data output sub-module () outputs the results to a user.