The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2005
Filed:
Jul. 30, 2003
Michio Yanagi, Saitama, JP;
Fumie Ishii, Saitama, JP;
Masayuki Uchiyama, Saitama, JP;
Takayuki Wakabayashi, Saitama, JP;
Michio Yanagi, Saitama, JP;
Fumie Ishii, Saitama, JP;
Masayuki Uchiyama, Saitama, JP;
Takayuki Wakabayashi, Saitama, JP;
Canon Denshi Kabushiki Kaisha, Saitama-ken, JP;
Abstract
The present invention provides a method of manufacturing an ND filter having a gradation density distribution, the ND filter, and an aperture device and a camera having the ND filter. A structure thereof is as follows. The method of manufacturing an ND filter having at least two kinds of films on a substrate includes the steps of: forming a film of at least one layer other than an outermost layer having a gradation density distribution while rotating a slit mask integrally with the substrate; and forming a film of the outermost layer without using the slit mask.