The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2005
Filed:
Apr. 25, 2002
Kazuyuki Yamane, Fukushima, JP;
Hiromitsu Miura, Fukushima, JP;
Toshihiko Ono, Fukushima, JP;
Junji Nakajima, Ibaraki, JP;
Daisuki Itoh, Ibaraki, JP;
Kazuyuki Yamane, Fukushima, JP;
Hiromitsu Miura, Fukushima, JP;
Toshihiko Ono, Fukushima, JP;
Junji Nakajima, Ibaraki, JP;
Daisuki Itoh, Ibaraki, JP;
Abstract
Crystalline polyglycolic acid wherein a difference between the melting point Tm and the crystallization temperature Tcis not lower than 35° C., and a difference between the crystallization temperature Tcand the glass transition temperature Tg is not lower than 40° C. A production process of polyglycolic acid modified in crystallinity, comprising applying heat history to crystalline polyglycolic acid at a temperature of not lower than (the melting point Tm of the crystalline polyglycolic acid+38° C.). A polyglycolic acid composition comprising crystalline polyglycolic acid and a heat stabilizer, wherein a difference (T−T) between the temperature Tat 3%-weight loss on heating of the polyglycolic acid composition and the temperature Tat 3%-weight loss on heating of the crystalline polyglycolic acid is not lower than 5° C.