The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6951380 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 04, 2005

Filed:

Jul. 09, 2003
Applicants:

Masahiko Kubota, Tokyo, JP;

Wataru Hiyama, Kanagawa, JP;

Inventors:

Masahiko Kubota, Tokyo, JP;

Wataru Hiyama, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J002/015 ; G03C005/00 ;
U.S. Cl.
CPC ...
Abstract

A liquid discharge head which is inexpensive, accurate, and highly reliable, and a method of manufacturing such a liquid discharge head are provided. On a substrate, a thermal crosslinking positive photosensitive material layer (a first positive photosensitive material layer) and a second positive photosensitive material layer are formed. First a pattern is formed on the second positive photosensitive material layer, then another pattern is formed on the first positive photosensitive material layer. Next, a negative resin for forming a liquid channel wall is laminated on the patterned first and second positive photosensitive material layers. A discharge port is formed in the negative resin layer and then the positive photosensitive material layers are removed. At this time, the first positive photosensitive material layer is an ionizing radiation decompositive positive resist composed of a methacrylic copolymer composite mainly containing methacrylic acid where a metacrylic acid unit is 2 to 30 wt % and molecular weight is 5,000 to 50,000, and the second positive photosensitive material layer is an ionizing radiation decompositive positive resist mainly containing polymethyl isopropenyl ketone.


Find Patent Forward Citations

Kubota, Masahiko. (2005). Method of manufacturing microstructure, method of manufacturing liquid discharge head, and liquid discharge head (U.S. Patent No. 6951380). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6951380

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