The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2005

Filed:

Jan. 16, 2002
Applicants:

Masashi Kiguchi, Kawagoe, JP;

Takuya Matsumoto, Hachioji, JP;

Tomohiro Hashizume, Hatoyama, JP;

Isamu Orita, Kokubunji, JP;

Inventors:

Masashi Kiguchi, Kawagoe, JP;

Takuya Matsumoto, Hachioji, JP;

Tomohiro Hashizume, Hatoyama, JP;

Isamu Orita, Kokubunji, JP;

Assignee:

Hitachi Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J003/14 ; G02F001/00 ;
U.S. Cl.
CPC ...
Abstract

Optical apparatuses are provided that use near-field light, where high spatial resolution and high sensitivity are made compatible. Highly intense near-field light is generated in a narrow area using localized plasmons that are produced in a metal patternin a shape that bears anisotropy and is made to irradiate a measured subject. The direction of polarizationof incident lightis modulated and signal light is subjected to synchronous detection, so that background light is removed and high sensitivity is achieved.


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