The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Jun. 24, 2003
Christian Krueger, Liegau-Augustusbad, DE;
Niels-wieland Hauptmann, Boxdorf, DE;
Thomas Beck, Ottendorf-Okrilla, DE;
Christian Krueger, Liegau-Augustusbad, DE;
Niels-Wieland Hauptmann, Boxdorf, DE;
Thomas Beck, Ottendorf-Okrilla, DE;
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
When changing a dopant species in an implantation tool, typically a clean process is performed to reduce cross-contamination, which is considered a major issue in implant cycles applied in advanced CMOS processes. Especially, the employment of an implanter previously used for heavy ions may generate increased cross-contamination when subsequently used for boron or phosphorus implants at moderate energies. A clean implant process using xenon gas may effectively reduce this cross-contamination at shorter process times compared to a conventional argon clean step.