The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Mar. 27, 2001
Werner Lautenschläger, Leutkirch/Allgäu, DE;
Bernd Ondruschka, Leipzig, DE;
Matthias Nüchter, Leipzig, DE;
Werner Lautenschläger, Leutkirch/Allgäu, DE;
Bernd Ondruschka, Leipzig, DE;
Matthias Nüchter, Leipzig, DE;
Milestone S.r.l., Soriole, IT;
Abstract
A devise for carrying out chemical reactions and processes in high-frequency fields, comprises a high-frequency chamberfor irradiating a solid, liquid or gaseous substance while under pressure with at least one radiation source and a reactor for exposing to a high-frequency field. The reactor being connectively coupled to the upper wallof the high-frequency chamberthrough a sealable connection. Rail elementsare provided around the reactor, and configured to form a pressure-resistant cage. The rail elementseach have a guidefor holding a crown-shaped holder. The holderis fixed in its position by the guidesof the rail elements. Multiple reaction chambers can be incorporated as a batch reactor system.