The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Feb. 21, 2003
Yasufumi Yamada, Tokyo, JP;
Katsumi Midorikawa, Saitama, JP;
Hiroshi Kumagai, Saitama, JP;
Ricoh Company, Ltd., Tokyo, JP;
Riken, Saitama, JP;
Abstract
A laser processing method capable of performing fine and highly accurate processing by low energy is obtained. The invention relates to the laser processing method where laser beam for processing () is irradiated on a processing object () and the laser beam for processing () directly removes a part of the processing object (). The processing object () is made of a glass substrate, metal thin film () having high absorption to laser beam for processing () is formed on a surface of glass substrate, into which laser beam for processing () is made incident, the laser beam for processing () is irradiated from a surface of metal thin film (), and matter is directly removed by irradiation of laser beam onto the processing object () in order to form a region finer than an irradiation region of laser beam for processing () on the processing object ().