The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Jun. 19, 2003
Applicant:
Paul Rich, Gloucestershire, GB;
Inventor:
Paul Rich, Gloucestershire, GB;
Assignee:
Trikon Holdings Limited, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C014/34 ; C23C008/00 ; C23C016/00 ; C23F001/00 ;
U.S. Cl.
CPC ...
Abstract
A method and apparatus for processing a thin film on a substrate. The method involves locating the substrate in a first rotational position a location opposed to a process station. The process station has a first axis and is arranged for processing the substrate about that axis. The substrate location is symmetrical about a second axis parallel to but offset from the first axis. The substrate is rotated about an axis generally orthogonal and passing through the wafer location to a second rotational position after an initial process and further processing takes place when the substrate is in the second rotational position.