The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Jul. 18, 2002
Applicants:
Jae-cheol Cha, Seoul, KR;
Kyu-won Jung, Anyang, KR;
Ho-su Han, Suwon, KR;
Inventors:
Assignee:
Samsung SDI Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J009/00 ; H01J009/24 ;
U.S. Cl.
CPC ...
Abstract
In a method for forming negative holes of a field emission display, a plurality of line patterns are first printed on a substrate, and then dried. The printing and drying of the line patterns are repeated until the line patterns are elevated to a predetermined height, then dot patterns are printed between the line patterns on the substrate and dried. The printing and drying of the dot patterns are repeated until the dot patterns are elevated to a predetermined height to define the negative holes enclosed by the line and dot patterns, and the line and dot patterns are simultaneously baked.