The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2005
Filed:
Jul. 22, 2003
Youzou Fukagawa, Tochigi, JP;
Youzou Fukagawa, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method includes steps of exposing each of first shot regions on a substrate to a plurality of first marks aligned at a predetermined interval via a master and a projection optical system, and exposing each of second shot regions on the substrate to a plurality of second marks aligned at the predetermined interval via the master and the projection optical system. The first and second shot regions are arranged so as to make positions of a plurality of transferred first and second marks on the substrate correspond to each other, and the number of the transferred first marks in the first shot region being larger than the number of the transferred second marks in the second shot region. In addition, a distortion amount of the projection optical system is calculated based on a positional difference measured for the transferred first and second marks which correspond to each other.