The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2005

Filed:

Aug. 29, 2003
Applicants:

Shoji Okuda, Aichi, JP;

Hiroshi Tokunaga, Nagano, JP;

Osamu Tsuboi, Kawasaki, JP;

Inventors:

Shoji Okuda, Aichi, JP;

Hiroshi Tokunaga, Nagano, JP;

Osamu Tsuboi, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/302 ;
U.S. Cl.
CPC ...
Abstract

The method for fabricating a micro machine comprises the step of burying an oxide filmin a first semiconductor substratethe step of bonding the first semiconductor substrate to the second semiconductor substrate with an insulation filmtherebetween, the step of forming a first maskwith an opening in a first region and a second region on both sides of the first region, the step of etching the first semiconductor substrate with a first maskand an oxide filmas a mask to thereby form a spring portionintegral with the first semiconductor substrate between the oxide film and the insulation film to thereby form a torsion bar including the spring portion, the step of forming a second maskwith an opening in the first region and the second region, the step of etching the second semiconductor substrate by using the second maskand the step of etching the insulation filmin the first region and the second region. The thickness of the torsion bar can be easily controlled. Thus, a micro machine having a torsion bar can be fabricated with high yields.


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