The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2005
Filed:
Apr. 10, 2003
Taizo Sato, Yamaguchi-ken, JP;
Toshiyuki Ueda, Yamaguchi-ken, JP;
Shinichi Aoki, Yamaguchi-ken, JP;
Toyo Kohan Co., Ltd., Tokyo, JP;
Abstract
A material for shadow mask having the following composition of components: C≦0.0008 wt %, Si≦0.03 wt %, Mn:0.1 to 0.5 wt %, P≦0.02 wt %, S≦0.02 wt %, Al:0.01 to 0.07 wt %, N≦0.0030 wt %, B: an amount satisfying the formula: 5 ppm≦B−11/14×N≦30 ppm, balance: Fe and inevitable impurities; a method for producing the material; a shadow mask using the material (cold rolled steel sheet); and an image receiving tube equipped with the shadow mask. The material has excellent etching characteristics, which are uniform within the same coil, and excellent press formability.