The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2005

Filed:

Mar. 16, 2004
Applicants:

Thomas D. Hayes, Schaumburg, IL (US);

Vipul J. Srivastava, Woodridge, IL (US);

Inventors:

Thomas D. Hayes, Schaumburg, IL (US);

Vipul J. Srivastava, Woodridge, IL (US);

Assignee:

Gas Technology Institute, Des Plaines, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B09B001/00 ;
U.S. Cl.
CPC ...
Abstract

A method for in-situ dense non-aqueous phase liquids treatment in which a subsurface source area comprising at least one rapid release contaminant is located and free water removed therefrom. The subsurface source area is then heated to a temperature suitable for extracting the at least one rapid release contaminant from the subsurface source area. The at least one rapid release contaminant is extracted from the subsurface source area, resulting in solidification of the dense non-aqueous phase liquids remaining in the subsurface source area.


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