The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2005

Filed:

Oct. 29, 2004
Applicants:

Billy W. Crue, Jr., San Jose, CA (US);

Mark David Thomas, Hollister, CA (US);

Zhupei Shi, San Jose, CA (US);

Renuka Apparao, Fremont, CA (US);

Inventors:

Billy W. Crue, Jr., San Jose, CA (US);

Mark David Thomas, Hollister, CA (US);

Zhupei Shi, San Jose, CA (US);

Renuka Apparao, Fremont, CA (US);

Assignee:

Western Digital (Fremont), Inc., Lake Forest, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B005/127 ; H04R031/00 ;
U.S. Cl.
CPC ...
Abstract

A method of forming a head comprises forming a write transducer on a wafer, cutting the wafer to produce a slider bar with a cut surface, and planarizing the cut surface of the slider bar. Forming the write transducer can include forming a first pole layer and forming a first pole pedestal layer over the first pole layer, where the first pole pedestal layer includes a tapered portion defined by a first end having a nose width less than a desired final nose width, and a second end having a zero throat width greater than the desired final nose width. Planarizing the cut surface of the slider bar exposes the first pole pedestal layer until a width thereof approximately equals the desired final nose width.


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