The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Nov. 19, 2003
Masatake Nukui, Tokyo, JP;
Shunichiro Tanigawa, Tokyo, JP;
Masatake Nukui, Tokyo, JP;
Shunichiro Tanigawa, Tokyo, JP;
GE Medical Systems Global Technology Company, LLC, Waukesha, WI (US);
Abstract
A beam hardening post-processing method that can improve the accuracy of channel-by-channel correction on a BH effect easily and yet taking a non-linear effect into account, phantoms of different diameters are disposed at a position offset from an imaging center to acquire projection information having a transmission length of an X-ray beam varying from view to view, hence, acquire projection information having a projection information value varying from view to view, for each channel, correction factors are determined, and a corrective function containing even a non-linear effect is determined by higher-order function fitting from the correction factors; and therefore, correction with high accuracy can be achieved in the channel-by-channel correction on the projection information values conducted after BH correction, and moreover, correction with high accuracy can be achieved using a smaller amount of phantom projection information, thus reducing the time for calibration work.